Waferpedia

Comparison ledger

0010 47763versusCentura Enabler Oxide

Applied Materials 0010 47763, Applied Materials Centura Enabler Oxide, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010 47763Applied Materials
Centura Enabler OxideApplied Materials
OEMApplied MaterialsApplied Materials
CategoryEtchEtch
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010 47763Applied Materials Centura
Cited variants—
  • Centura Enabler (2008 Vintage)[1]
  • Centura Enabler (Server OS Type 2008 Vintage)[2]
Specifications
Configuration2nd Source New[3]Server OS Type[2]
TypeMonopolar Dual Heated[4]—
DescriptionASSY, ESC, BONDED, MONOPOLAR DUAL HEATED[5]—
Possible MaterialsAl2O3 (aluminum oxide) or AlN (aluminum nitride)[4]—
Model0010-47763[3]Centura Enabler[7]
OEMApplied Materials[3]Applied Materials[7]
Material (possible)Al2O3 (aluminum oxide) or AlN (aluminum nitride)[4]—
ApplicationFixing wafers in etching process (PVD, CVD, ETCH)[4]—
Quantity available (source)1[4]—
Equipment type—Oxide Etcher[7]
Server OS Type—2008 Vintage[2]

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Sources (7)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]Equipment inventory listing
  3. [3]inventory listing
  4. [4]saulcontrol.comsaulcontrol.com
  5. [5]getspares.comgetspares.com
  6. [6]inventory listing
  7. [7]Equipment inventory listing