Comparison ledger
Applied Materials 0010-22161 High EFF RF Match, Zeiss Auriga 60, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-22161 High EFF RF MatchApplied Materials | Auriga 60Zeiss |
|---|---|---|
| OEM | Applied Materials | Zeiss |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-22161 High EFF RF Match | Zeiss Auriga 60 |
| Specifications | ||
| Make | Applied Materials[1] | — |
| Model | 0010-22161[1] | — |
| Description | HTESC PH 1 REV A[2] | — |
| Condition | Used[2] | — |
| Stock Number | BM6628[2] | — |
| Electron Column | — | Zeiss Gemini Schottky field emission column[3] |
| Electron Beam Resolution at 15 kV | — | 1.0 nm[3] |
| Electron Beam Resolution at 1 kV | — | 1.9 nm[3] |
| Electron Beam Voltage Range | — | 0.1 kV to 30 kV[3] |
| Electron Beam Current Range | — | 4 pA to 100 nA[4] |
| Ion Column | — | Orsay Physics Cobra Ga+ liquid metal ion source[3] |
| Ion Beam Resolution at 30 kV | — | 2.5 nm[3] |
| Ion Beam Voltage Range | — | 0.2 kV to 30 kV[3] |
| Ion Beam Current Range | — | 1 pA to 50 nA[3] |
| Magnification | — | 12x to 1,000,000x[3] |
| Stage Capacity | — | Wafers up to 150 mm (6 inches) diameter[3] |
| Detectors | — | In-lens SE, SESI, EsB, 4QBSD, STEM detector[5] |
| EDX Detector | — | EDAX EDX detector[5] |
| EBSD Detector | — | EDAX EBSD detector[5] |
| Gas Injection System | — | C, Pt, Si, XeF2[5] |
| Manipulator | — | Omniprobe 400 with independent x,y,z motion and rotation[5] |
| Transfer System | — | High-vacuum transfer system compatible with glove box and UHV deposition[5] |
| Accessory Ports | — | 23 free accessory ports (standard Auriga has 15)[3] |
| Stage Travel | — | Motorized stage with 6 axes[3] |