Comparison ledger
Applied Materials 0010-22161 High EFF RF Match, Perkin Elmer 11 067 Ion Gun Control, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-22161 High EFF RF MatchApplied Materials | 11 067 Ion Gun ControlPerkin Elmer |
|---|---|---|
| OEM | Applied Materials | Perkin Elmer |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-22161 High EFF RF Match | Perkin Elmer 11 067 Ion Gun Control |
| Specifications | ||
| Make | Applied Materials[1] | — |
| Model | 0010-22161[1] | — |
| Description | HTESC PH 1 REV A[2] | — |
| Condition | Used[2] | — |
| Stock Number | BM6628[2] | — |
| Beam voltage range | — | 0 to +5000 volts DC[3] |
| Focus ratio | — | 70-100% of beam voltage[3] |
| Minimum focus voltage | — | 100 volts DC[3] |
| Raster amplitude | — | 0 to +200 volts peak-to-peak[3] |
| Pressure range | — | 0-50 mP[3] |
| Anode current | — | 25 uA at 50 mP[3] |
| Output current | — | 50 mA[3] |
| Stability | — | 1% per hour[3] |
| Ripple | — | 0.2 V peak-to-peak[3] |