Comparison ledger
Applied Materials 0010-22161 High EFF RF Match, Nikon NSR SF 130, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-22161 High EFF RF MatchApplied Materials | NSR SF 130Nikon |
|---|---|---|
| OEM | Applied Materials | Nikon |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-22161 High EFF RF Match | Nikon NSR SF 130 |
| Specifications | ||
| Make | Applied Materials[1] | — |
| Model | 0010-22161[1] | — |
| Description | HTESC PH 1 REV A[2] | — |
| Condition | Used[2] | — |
| Stock Number | BM6628[2] | — |
| Exposure Wavelength | — | i-line (365 nm)[3] |
| Numerical Aperture | — | ~0.50[3] |
| Max Wafer Size | — | 200 mm[3] |
| Throughput | — | ~100 wafers/hour[3] |
| Common Process Node | — | ≥ 0.25 μm[3] |
| Release Era | — | Early 2000s[3] |
| Optical System | — | High-quality projection lenses optimized for i-line lithography[3] |
| Stage and Alignment | — | Precision wafer stage with interferometer-based positioning, sub-micron alignment accuracy[3] |
| Automation | — | Motorized reticle loaders, wafer handling robots, SMIF pods[3] |
| Control Electronics | — | Proprietary Nikon control software and hardware[3] |