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Comparison ledger

0010-22161 High EFF RF MatchversusTS 3000

Applied Materials 0010-22161 High EFF RF Match, MPI TS 3000, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMApplied MaterialsMPI
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-22161 High EFF RF MatchMPI TS 3000
Cited variants—
Specifications
MakeApplied Materials[3]—
Model0010-22161[3]TS 3000[5]
DescriptionHTESC PH 1 REV A[4]—
ConditionUsed[4]—
Stock NumberBM6628[4]—
Manufacturer—MPI[5]
System type—300 mm automated probe system[1]
Applications—DC-IV, DC-CV, Pulsed-IV, RF, mmW, load-pull, IC Design Validation, Failure Analysis[1]
Chuck XY stage travel range—310 mm x 335 mm[1]
Chuck XY stage resolution—0.5 µm[1]
Chuck Z stage travel range—30 mm[1]
Chuck Z stage resolution—0.2 µm[1]
Wafer loading—150 mm, 200 mm, or 300 mm wafers or substrates[1]
Probe card holder—4.5 x 11 in[1]
Max. no. of micropositioners—10x DC MicroPositioners or 4x DC + 4x HF MicroPositioner[1]
Temperature range—20 °C to 300 °C[1]
Temperature range with IceFreeEnvironment—-60 °C to 300 °C[1]
Control software—SENTIO[1]
Chuck top material—Nickel plated aluminum[1]
Chuck surface—Planar with 0.5 mm diameter holes in centric sections[1]
Supported DUT sizes—Single DUTs down to 5x5 mm size or wafers 100 mm thru 300 mm[2]
Maximum voltage between chuck top and GND—500 V DC[1]
Sources (5)Every fact above is drawn from these public sources
  1. [1]mpi.com.twmpi.com.tw
  2. [2]mpi-corporation.commpi-corporation.com
  3. [3]Equipment inventory listing
  4. [4]tarasemi.comtarasemi.com
  5. [5]Equipment inventory listing