Comparison ledger
Applied Materials 0010-22161 High EFF RF Match, Hitachi Z-5010, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-22161 High EFF RF MatchApplied Materials | Z-5010Hitachi |
|---|---|---|
| OEM | Applied Materials | Hitachi |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-22161 High EFF RF Match | Hitachi Z-5010 |
| Specifications | ||
| Make | Applied Materials[1] | — |
| Model | 0010-22161[1] | — |
| Description | HTESC PH 1 REV A[2] | — |
| Condition | Used[2] | — |
| Stock Number | BM6628[2] | — |
| Insp | — | spectrophotometer/Zeeman[3] |
| Light Source | — | Hollow cathode lamp (hollow cathode lamp)[4] |
| Optical System | — | Polarized Zeeman correction (DC magnetic field)[4] |
| Spectrometer | — | Czerny-Turner mount[4] |
| Detector | — | Photomultiplier tube[4] |
| Measurement Mode | — | Flame method[4] |
| Wavelength Range | — | 190-900 nm[5] |
| Resolution | — | 0.2 nm[5] |
| Dimensions (W x D x H) | — | 600 mm x 600 mm x 400 mm[5] |
| Weight | — | Approx. 40 kg[5] |
| Maximum Number of Elements | — | 6 elements[5] |
| Analysis Methods | — | Polarized Zeeman method, air-acetylene method, nitrous oxide method[5] |