Comparison ledger
Applied Materials 0010-22161 High EFF RF Match, Hitachi U 3900 H Spectrophotometer, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-22161 High EFF RF MatchApplied Materials | U 3900 H SpectrophotometerHitachi |
|---|---|---|
| OEM | Applied Materials | Hitachi |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-22161 High EFF RF Match | Hitachi U 3900 |
| Specifications | ||
| Make | Applied Materials[1] | — |
| Model | 0010-22161[1] | U 3900 H[3] |
| Description | HTESC PH 1 REV A[2] | — |
| Condition | Used[2] | — |
| Stock Number | BM6628[2] | — |
| Configuration | — | CPU, Monitor, Connector, Lens holder[3] |
| Year | — | 2008[3] |
| Manufacturer | — | Hitachi[4] |
| Instrument type | — | Spectrophotometer[4] |
| Vintage | — | 2008[3] |
| Included items | — | CPU, monitor, connector, lens holder[3] |
| Monochromator | — | Diffraction grating-diffraction grating double monochromator, Seya-Namioka mount[5] |
| Wavelength range | — | 190 to 900 nm[5] |
| Spectral bandpass | — | 0.1, 0.5, 1, 2, 4, 5 nm (6 steps)[5] |
| Wavelength accuracy | — | ±0.1 nm at 656.1 nm after wavelength calibration[5] |
| Absorbance range | — | -5.5 to 5.5 Abs, 0 to 300%T[5] |
| Baseline flatness | — | Within ±0.0004 Abs[5] |
| Light source | — | WI lamp for visible range and D2 lamp for ultraviolet range[5] |
| Software | — | UV Solutions program for U-3900 in connection with PC[5] |
| OEM | — | Hitachi[3] |
| Manufactured year | — | 2008[4] |
| Control software | — | UV Solutions program for U-3900 in connection with PC[4] |