Comparison ledger
Applied Materials 0010-22161 High EFF RF Match, ESI 5200, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-22161 High EFF RF MatchApplied Materials | 5200ESI |
|---|---|---|
| OEM | Applied Materials | ESI |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-22161 High EFF RF Match | ESI 5200 |
| Specifications | ||
| Make | Applied Materials[1] | — |
| Model | 0010-22161[1] | — |
| Description | HTESC PH 1 REV A[2] | — |
| Condition | Used[2] | — |
| Stock Number | BM6628[2] | — |
| Rep Rate Range (kHz) | — | 3-20[3] |
| Max Work Surface Power (W) | — | 1.9[3] |
| Pulse Width (ns) | — | 22+/-10 @3kHz, 35 @10kHz, 55+/-30 @18kH[3] |
| Repetition Rate Range | — | 3-20 kHz[3] |
| Max Work Surface Power | — | 1.9 W[3] |
| Pulse Width @3kHz | — | 22±10 ns[3] |
| Pulse Width @10kHz | — | 35 ns[3] |
| Pulse Width @18kHz | — | 55±30 ns[3] |
| Vintage | — | 1998[3] |