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0010-22161 High EFF RF MatchversusDektak 3030

Applied Materials 0010-22161 High EFF RF Match, Bruker Dektak 3030, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMApplied MaterialsBruker
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-22161 High EFF RF MatchBruker Dektak 3030
Specifications
MakeApplied Materials[1]—
Model0010-22161[1]Dektak 3030[3]
DescriptionHTESC PH 1 REV A[2]—
ConditionUsed[2]—
Stock NumberBM6628[2]—
Manufacturer—Bruker / Veeco[3]
Wafer size—8 inch[3]
Vertical range—100 angstroms(A) to 1,310KA[4]
Vertical resolution—1A/65KA, 20A/1,310KA[4]
Scan length range—50 microns to 50mm[4]
Scan speed ranges—Low, medium, high[4]
Software leveling—2-point programmable or cursor leveling[4]
Stage leveling—Manual[4]
Stylus force—1mg to 40mg[4]
Maximum sample thickness—45mm(1.5")[4]
Sample stage diameter—165mm[4]
Zoom magnification—60X to 420X[4]
Motorized zoom camera—Solid state monochrome image[4]
Sources (4)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]tarasemi.comtarasemi.com
  3. [3]Equipment inventory listing
  4. [4]culverequipment.comculverequipment.com