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Comparison ledger

0010-14300 Magnet AssyversusxR 200 S

Applied Materials 0010-14300 Magnet Assy, Applied Materials xR 200 S, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-14300 Magnet AssyApplied Materials
xR 200 SApplied Materials
OEMApplied MaterialsApplied Materials
CategoryIon ImplantationIon Implantation
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-14300 Magnet AssyApplied Materials xR 200 S
Cited variants—
  • Precision Implant xR 200 S[1]
  • High Current xR 200 S[1]
Specifications
ConfigurationP4 Magnet Assy, IMP[2]50/60 Hz[3]
Gearbox P/N0010-27417[2]—
Part Number0010-14300[2]—
DescriptionP4 Magnet Assy, IMP[2]—
Phase—3 Phase[3]
Last Wafer Processed—May 2024[4]
OEM—Applied Materials[3]
Model—xR 200 S[3]
Category—Ion Implantation[4]
Wafer Sizes—8 inch[3]
Power—3 Phase[4]
Frequency—50/60 Hz[3]
Vacuum—Cryo pump[4]
Gas delivery—Gas cylinders removed[4]
Gas lines and beamline—Purged with N2[3]
Includes Spare Parts—3 spare sources; 2 bushings; 3 MRS (Mass Revolving System); 2 source housing; Flight tube; Many parts for source maintenance and tool maintenance[3]
Wafer Size—8 inch[3]
Power Phase—3 Phase[3]
Power Frequency—50/60 Hz[3]
Automation—Fully Automated[3]
Vintage—2003[3]
Vacuum Pump—Cryo pump[3]
Gas Delivery—Gas cylinders removed; gas lines and beamline purged with N2[3]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]waferpedia.comwaferpedia.com
  2. [2]inventory listing
  3. [3]inventory listing
  4. [4]waferpedia.comwaferpedia.com