Comparison ledger
Applied Materials 0010-14300 Magnet Assy, Applied Materials PI 9500 Ion, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-14300 Magnet AssyApplied Materials | PI 9500 IonApplied Materials |
|---|---|---|
| OEM | Applied Materials | Applied Materials |
| Category | Ion Implantation | Ion Implantation |
| Wafer size | — | Wafer Loader Blade Control PCB |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-14300 Magnet Assy | Applied Materials PI 9500 |
| Specifications | ||
| Configuration | P4 Magnet Assy, IMP[1] | Belt Drive[2] |
| Gearbox P/N | 0010-27417[1] | — |
| Part Number | 0010-14300[1] | — |
| Description | P4 Magnet Assy, IMP[1] | — |
| Frequency | — | 60 Hz[2] |
| Utilities | — | Top feed[2] |
| Water fittings | — | Imperial[2] |
| Remote distance | — | 6m umbilical[2] |
| Layout | — | Thru wall[2] |
| Wafer cassette | — | 26 wafers[2] |
| Helium line length | — | 15 m[2] |
| Factory interface | — | SECS / GEM[2] |
| Tilt angle | — | Variable 0-7 degree[2] |
| Plasma Flood System | — | HDPFS[2] |
| Beamline | — | Standard[2] |
| Source type | — | Bernas[2] |
| Front plate | — | Tungsten[2] |
| Extraction type | — | Single bellows[2] |
| Make | — | Applied Materials[2] |
| Model | — | PI 9500[2] |
| Equipment type | — | Ion Implanter[2] |
| Wafer Sizes | — | 6 inch[2] |
| Drive | — | Belt Drive[2] |
| Pumps | — | Leybold Turbo pumps; Ebara A07V Mech pump; CTI Cryo pump[2] |
| Standard wheel | — | 25 wfr wheel[2] |
| Source chamber liners | — | Included[2] |
| MRS Chamber Liners | — | Included[2] |
| Gas position 1 | — | Boron (gas module missing)[2] |
| Gas position 2 | — | n/a (gas module missing)[2] |
| Gas position 3 | — | Phosphine[2] |
| Gas position 4 | — | Arsine[2] |
| Wafer size | — | Wafer Loader Blade Control PCB[2] |
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