Waferpedia

Comparison ledger

0010-14300 Magnet AssyversusHEXP VIISta HE

Applied Materials 0010-14300 Magnet Assy, Applied Materials HEXP VIISta HE, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-14300 Magnet AssyApplied Materials
HEXP VIISta HEApplied Materials
OEMApplied MaterialsApplied Materials
CategoryIon ImplantationIon Implantation
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-14300 Magnet AssyApplied Materials HEXP VIISta HE
Specifications
ConfigurationP4 Magnet Assy, IMP[1]Includes:[2]
Gearbox P/N0010-27417[1]—
Part Number0010-14300[1]—
DescriptionP4 Magnet Assy, IMP[1]—
Chiller—SMC remote 20M[2]
Cryo Pump—320FE CRYO OBIS,6[3]
Cryo Pump Exhaust—SS Cryo Exhaust Through Roof[3]
Cryo Compressor—IS-1000 KPa X 3[3]
Dosimetry—Advanced[2]
Facilities—Faci fr Botm(Air-N2-H2O-Power)[3]
Frequency—60 Hz Operation[3]
Label Kit—English[2]
Load Lock Vent—500 Load LockVent Std Finish[3]
Load Lock Vent Connection—500 Vent Con Std Finish[3]
Manometer—Triple Manometer 0-1 kPa[2]
Power Kit—Standard Power Kit[2]
Profiler—Standard Rack and Pinion[2]
Remote Harness Kit—20M Rem Facilites Kit - Floor[2]
RP3 Exhaust—RP3 PVC Exhaust Line - Roof[3]
Wafer Size—8 inch (200mm)[2]
Platen Type—200mm SiC[2]
Source Material—SiC[2]
UPS/CVCF—Standard UPS 3KVA - No CVCF[2]
VCS Software Package—VCS 9.XX (Specify revision)[2]
Roughing Pump Supply—Customer Supplied Pumps Onsite[2]
Turbo Pump Supply—VSE Supplied Pumps[2]
Wafer Handler Side Window Kit—Windows[2]

Plan your fab

Building a Ion Implantation process? Get a complete equipment list.

Open the fab equipment planner →
Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]waferpedia.comwaferpedia.com