Comparison ledger
Applied Materials 0010-14300 Magnet Assy, Applied Materials 9500 XR, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-14300 Magnet AssyApplied Materials | 9500 XRApplied Materials |
|---|---|---|
| OEM | Applied Materials | Applied Materials |
| Category | Ion Implantation | Ion Implantation |
| Wafer size | — | Wafer on Gripper Sensor |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-14300 Magnet Assy | Applied Materials PI 9500 |
| Specifications | ||
| Configuration | P4 Magnet Assy, IMP[1] | 50/60 Hz[2] |
| Gearbox P/N | 0010-27417[1] | — |
| Part Number | 0010-14300[1] | — |
| Description | P4 Magnet Assy, IMP[1] | — |
| Voltage | — | 208 V[2] |
| Phase | — | 3 phase + Neurtal[2] |
| Circuit Breaker | — | 250 A[2] |
| Interrupt Capacity | — | 65000 A[2] |
| CPU | — | 162 031[2] |
| Software | — | 4.09[2] |
| Chamber | — | CT 10 Cryos[2] |
| Source Turbo | — | STP 1000 C[2] |
| Mrs Turbo | — | STP 400[2] |
| Source Backing | — | QDP 40[2] |
| Wafer Loader | — | QDP 80[2] |
| Wafer size | — | Wafer on Gripper Sensor[2] |
| Wheel | — | Direct Drive[2] |
| Tilt | — | 0 to 7[2] |
| BF3 | — | SDS[2] |
| Manufacturer | — | Applied Materials[2] |
| Model | — | 9500 XR[2] |
| Category | — | Ion Implantation[3] |
| Wafer size / configuration | — | Wafer on Gripper Sensor[3] |
| Frequency | — | 50/60 Hz[2] |
| Orient | — | Flat Not Found Sensor[2] |
| Gripper | — | Wafer on Gripper Sensor[2] |
| Gas Box | — | BF3, PH3, AsH3[2] |
| Source Type | — | IHC Enlarged Chamber[2] |
| Oven Capabilities | — | Yes, No ovens fitted to source[2] |
| Source Magnet | — | 5A[2] |
| Dual Extraction | — | Bellows, 60 kV, 160 kV max[2] |
| Post Acell | — | Total Energy: 200 kV Max[2] |
| Plasma Flood Gun | — | Standard[2] |
| PH3 | — | SDS[2] |
| AsH3 | — | SDS[2] |
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