Comparison ledger
Applied Materials 0010-13622 RF Match for, Pfeiffer ACP040G, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-13622 RF Match forApplied Materials | ACP040GPfeiffer |
|---|---|---|
| OEM | Applied Materials | Pfeiffer |
| Category | Deposition | Deposition |
| Wafer size | — | 100mm |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-13622 RF Match for | Pfeiffer ACP040G |
| Specifications | ||
| Configuration | High Efficiency HE RF Match-Bias[1] | — |
| Model | 0010-13622[1] | — |
| Product Type | RF Match for PVD (Physical Vapor Deposition)[1] | — |
| Feature | High Efficiency HE RF Match-Bias[1] | — |
| Role | — | Chamber primary pump[2] |
| Pump type | — | Dry pump[2] |
| Associated system | — | EVA 451 thermal evaporator[2] |
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