Comparison ledger
Applied Materials 0010-13622 RF Match for, Oxford Instruments NGP 1000, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-13622 RF Match forApplied Materials | NGP 1000Oxford Instruments |
|---|---|---|
| OEM | Applied Materials | Oxford Instruments |
| Category | Deposition | Deposition |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-13622 RF Match for | Oxford Instruments NGP 1000 |
| Specifications | ||
| Configuration | High Efficiency HE RF Match-Bias[1] | Load Locked Chamber[2] |
| Model | 0010-13622[1] | — |
| Product Type | RF Match for PVD (Physical Vapor Deposition)[1] | — |
| Feature | High Efficiency HE RF Match-Bias[1] | — |
| Category | — | Deposition[2] |
| Process | — | Plasma-enhanced chemical vapor deposition (PECVD)[3] |
| Wafer size capability | — | up to 450 mm[3] |
| Configured unit wafer size (2012 vintage) | — | 8 inch[4] |
| RF power | — | 600 W 13.56 MHz HF RF generator[2] |
| Process type | — | PECVD (Plasma-Enhanced Chemical Vapor Deposition)[4] |
| Wafer size | — | 8 inch[4] |
| Vintage year | — | 2012[4] |
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