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Comparison ledger

0010-13622 RF Match forversusMark 50 E-Beam

Applied Materials 0010-13622 RF Match for, CHA Mark 50 E-Beam, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-13622 RF Match forApplied Materials
OEMApplied MaterialsCHA
CategoryDepositionDeposition
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-13622 RF Match forCHA Mark 50
Specifications
ConfigurationHigh Efficiency HE RF Match-Bias[1]110 / 220 Vac[2]
Model0010-13622[1]—
Product TypeRF Match for PVD (Physical Vapor Deposition)[1]—
FeatureHigh Efficiency HE RF Match-Bias[1]—
Phase—3 Phase[2]
Frequency—50 Hz[2]
Power Supply—3 Phase, 110/220 Vac, 50 Hz[2]
Wires—5[2]
Compressor—CTI 9700 A[2]
E-Beam Power Supply—Ulvac HPS 1000 F[2]
Transformer—IMAI NT 3 X[3]
CHA SR 10—Included[3]
Vintage—2016[2]
Compatibility—Class A and B Metals and Compounds[4]
Restrictions—No high vapor pressure materials; no oxide evaporation[4]
Voltage—110/220 Vac[2]
Vintage Year—2016[2]
Location (CNF)—Room 110[4]
Category—E-Beam Evaporator[5]
Electrical Specifications—3 Phase - 110 / 220 Vac - 50 Hz - 5 Wires[2]
Additional Components—CHA SR 10 - IMAI NT 3 X Transformer[3]
Class Compatibility—5 - Class A and B Metals and Compounds[4]

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Sources (5)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]inventory listing
  4. [4]cnfusers.cornell.educnfusers.cornell.edu
  5. [5]Equipment inventory listing