Comparison ledger
Applied Materials 0010-13622 RF Match for, Applied Materials Endura HP, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-13622 RF Match forApplied Materials | Endura HPApplied Materials |
|---|---|---|
| OEM | Applied Materials | Applied Materials |
| Category | Deposition | Deposition |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-13622 RF Match for | Applied Materials Endura |
| Specifications | ||
| Configuration | High Efficiency HE RF Match-Bias[1] | 50/60 Hz[2] |
| Model | 0010-13622[1] | — |
| Product Type | RF Match for PVD (Physical Vapor Deposition)[1] | — |
| Feature | High Efficiency HE RF Match-Bias[1] | — |
| Voltage | — | 208 VAC[2] |
| Full Load Current | — | 416 A[2] |
| Maximum System Rating | — | 150 KVA[2] |
| Ampere Rating of Largest Load | — | 200 A[2] |
| Interrupt Current | — | 10,000 AMPS I.C.[2] |
| Power | — | 208 VAC[2] |
| Frequency | — | 50/60 Hz[2] |
| Version | — | 200 MM[3] |
| Vintage | — | 01.06.2005[3] |
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