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Comparison ledger

0010-13622 RF Match forversusEndura CL

Applied Materials 0010-13622 RF Match for, Applied Materials Endura CL, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-13622 RF Match forApplied Materials
Endura CLApplied Materials
OEMApplied MaterialsApplied Materials
CategoryDepositionDeposition
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-13622 RF Match forApplied Materials Endura
Cited variants—
Specifications
ConfigurationHigh Efficiency HE RF Match-Bias[4]Preclean[1]
Model0010-13622[4]Endura CL[1]
Product TypeRF Match for PVD (Physical Vapor Deposition)[4]—
FeatureHigh Efficiency HE RF Match-Bias[4]—
Phase—3 Phase[5]
Voltage—400V[5]
Chamber E—Degas[5]
Chamber F—Degas[5]
SUB Rack—BULE Distribution Rack[5]
Chamber—D (PC-XT), 1 (IMP), 2/3 (TxZ)[6]
OEM—Applied Materials[1]
Equipment type—Chamber[1]
Chamber configuration—Preclean[1]
Vintage—2002[1]
Make—Applied Materials[1]
Product detail—Preclean 2002 Vintage[1]

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Sources (8)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]Equipment inventory listing
  3. [3]Equipment inventory listing
  4. [4]inventory listing
  5. [5]inventory listing
  6. [6]inventory listing
  7. [7]inventory listing
  8. [8]Equipment inventory listing