Comparison ledger
Applied Materials 0010-03485 Magnet Assy, Zeiss LSM 880, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03485 Magnet AssyApplied Materials | LSM 880Zeiss |
|---|---|---|
| OEM | Applied Materials | Zeiss |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-03485 Magnet Assy | Zeiss LSM 880 |
| Cited variants | — |
|
| Specifications | ||
| Configuration | WP AL 300mm PVD[2] | — |
| OEM | Applied Materials[2] | — |
| Model | 0010-03485[2] | — |
| Description | MAGNET ASSY, WP AL 300MM PVD[3] | — |
| Process | PVD[4] | — |
| Wafer size | 300mm[5] | — |
| Version | Spares[5] | — |
| Part Number | 0010-03485[2] | — |
| Manufacturer | Applied Materials[2] | — |
| Process Type | PVD (Physical Vapor Deposition)[2] | — |
| Application (Material) | Aluminum (AL)[2] | — |
| Wafer Diameter (associated) | 300 mm[2] | — |
| Laser Line 405 nm | — | 30 mW[6] |
| Laser Line 458/488/514 nm | — | 25 mW multi-line[6] |
| Laser Line 561 nm | — | 20 mW[6] |
| Laser Line 633 nm | — | 5 mW[6] |
| Additional Laser Lines | — | HeNe 594 nm, pulsed 405 nm and 440 nm[7] |
| Detectors | — | 2 PMT, 1 GaAsP, 1 Airyscan (32 GaAsP)[6] |
| Frame Rate | — | 19 frames per second at 512 x 512 pixel resolution[6] |
| Computer System | — | 2x Intel Xeon E5-2623 v3 3.0 GHz, 64GB DDR4-2133 MHz ECC RAM, 4x 2TB RAID 10, NVIDIA Quadro K2200 4GB, Windows 7 Ultimate Embedded x64[6] |
| Software | — | Zeiss Zen 2.3 (Black Edition)[6] |
| Objectives | — | LD C-Apochromat 40x/1.1 W Corr, Plan-APOCHROMAT 100x/1.4 Oil Ph3, Plan-Apochromat 40x/1.3 and 63x/1.4 Oil DIC, Plan-Apochromat 20x/0.8 WD=0.55, Plan-Apochromat 10x/0.45 WD=2.0[7] |
| Scanhead | — | Quasar module with 32-channel GaAsP detector and two flanking multialkali PMTs[7] |