Waferpedia

Comparison ledger

0010-03485 Magnet Assyversus2300C/D

Applied Materials 0010-03485 Magnet Assy, Varian 2300C/D, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-03485 Magnet AssyApplied Materials
2300C/DVarian
OEMApplied MaterialsVarian
Category——
Wafer size——
Process node——
Introduced——
Production run—1987–2007
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-03485 Magnet AssyVarian 2300C/D
Specifications
ConfigurationWP AL 300mm PVD[1]—
OEMApplied Materials[1]—
Model0010-03485[1]—
DescriptionMAGNET ASSY, WP AL 300MM PVD[2]—
ProcessPVD[3]—
Wafer size300mm[4]—
VersionSpares[4]—
Part Number0010-03485[1]—
ManufacturerApplied Materials[1]—
Process TypePVD (Physical Vapor Deposition)[1]—
Application (Material)Aluminum (AL)[1]—
Wafer Diameter (associated)300 mm[1]—
Power source—Klystron[5]
Photon energy configuration—6 & 10/15/18/25 MV[5]
Maximum dose rate (photons)—600 MU/min[5]
Electron energies—Yes[5]
Maximum dose rate (electrons)—1000 MU/min[5]
Multi-leaf collimator (MLC)—80 leaves (field size 40x40 cm); 120 leaves available (field size 40x40 cm, central 20 cm 5 mm leaf width, outer 20 cm 10 mm leaf width)[5]
Portal imager (EPID)—LC250, aS500, aS1000 (optional)[5]
kV imaging for IGRT—OBI (optional)[5]
Cone-beam CT—Only with OBI[5]
Treatment delivery—3D, IMRT, SRS/SBRT (optional)[5]
Stereotactic radiosurgery—Optional cones or mMLC[5]
Treatment couch—Exact ETR, Exact (optional)[5]
iCBCT—No[5]
ART (adaptive radiotherapy)—No[5]
VMAT—Only with OBI[5]
Sources (5)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]semistarcorp.comsemistarcorp.com
  3. [3]layla-ec.comlayla-ec.com
  4. [4]fabsurplus.comfabsurplus.com
  5. [5]oncologysystems.comoncologysystems.com