Comparison ledger
Applied Materials 0010-03485 Magnet Assy, Ulvac Phi Adept 1010 Automated Depth Profiling, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03485 Magnet AssyApplied Materials | |
|---|---|---|
| OEM | Applied Materials | Ulvac |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-03485 Magnet Assy | Ulvac Phi Adept 1010 Automated Depth Profiling |
| Specifications | ||
| Configuration | WP AL 300mm PVD[1] | — |
| OEM | Applied Materials[1] | — |
| Model | 0010-03485[1] | Phi Adept 1010[5] |
| Description | MAGNET ASSY, WP AL 300MM PVD[2] | — |
| Process | PVD[3] | — |
| Wafer size | 300mm[4] | — |
| Version | Spares[4] | — |
| Part Number | 0010-03485[1] | — |
| Manufacturer | Applied Materials[1] | Ulvac[5] |
| Process Type | PVD (Physical Vapor Deposition)[1] | — |
| Application (Material) | Aluminum (AL)[1] | — |
| Wafer Diameter (associated) | 300 mm[1] | — |
| Instrument type | — | Quadrupole dynamic secondary ion mass spectrometer (SIMS)[6] |
| Primary beam energy range | — | 0.25–11 keV[7] |
| Mass range | — | 1–340 amu[7] |
| Net weight | — | 1,350 kg[6] |
| Shipping weight | — | ~2,400 kg[6] |
| Power supply | — | 200–230 V AC, 50/60 Hz, 50 A (single-phase)[6] |
| Operating temperature | — | 20°C ± 3°C[6] |
| Relative humidity | — | <50%[6] |