Comparison ledger
Applied Materials 0010-03485 Magnet Assy, SCREEN CW 2000 Compact, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03485 Magnet AssyApplied Materials | CW 2000 CompactSCREEN |
|---|---|---|
| OEM | Applied Materials | SCREEN |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-03485 Magnet Assy | SCREEN CW 2000 |
| Specifications | ||
| Configuration | WP AL 300mm PVD[1] | — |
| OEM | Applied Materials[1] | — |
| Model | 0010-03485[1] | CW 2000[5] |
| Description | MAGNET ASSY, WP AL 300MM PVD[2] | — |
| Process | PVD[3] | — |
| Wafer size | 300mm[4] | — |
| Version | Spares[4] | — |
| Part Number | 0010-03485[1] | — |
| Manufacturer | Applied Materials[1] | — |
| Process Type | PVD (Physical Vapor Deposition)[1] | — |
| Application (Material) | Aluminum (AL)[1] | — |
| Wafer Diameter (associated) | 300 mm[1] | — |
| Station 1 | — | Loader[5] |
| Station 2 | — | ACT 930 (Solvent for Etch Residue and Positive Photoresist)[5] |
| Station 3 | — | Quick Dump Risse (QDR)[5] |
| Station 4 | — | IPA[5] |
| Station 5 | — | Quick Dump Rinse (QDR)[5] |
| Station 6 | — | Drain IPA Substitution (DIS)[5] |
| Make | — | SCREEN / DNS[5] |
| Equipment type | — | Wet Station[5] |
| Wafer sizes | — | 2, 4, 5, 6, 8 inch[5] |
| Vintage | — | 2018[6] |