Waferpedia

Comparison ledger

0010-03485 Magnet AssyversusTurbomolecular Vacuum

Applied Materials 0010-03485 Magnet Assy, Pfeiffer Turbomolecular Vacuum, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-03485 Magnet AssyApplied Materials
OEMApplied MaterialsPfeiffer
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-03485 Magnet AssyPfeiffer Turbomolecular Vacuum
Cited variants—
  • SplitFlow 80 Neo[1]
  • SplitFlow 350[1]
Specifications
ConfigurationWP AL 300mm PVD[2]—
OEMApplied Materials[2]—
Model0010-03485[2]-[6]
DescriptionMAGNET ASSY, WP AL 300MM PVD[3]—
ProcessPVD[4]—
Wafer size300mm[5]—
VersionSpares[5]—
Part Number0010-03485[2]—
ManufacturerApplied Materials[2]—
Process TypePVD (Physical Vapor Deposition)[2]—
Application (Material)Aluminum (AL)[2]—
Wafer Diameter (associated)300 mm[2]—
Turbo Pump—Pfeiffer TMU 071 P[6]
Turbo Controller—Pfeiffer TC 600[6]
Cooling Module—Pfeiffer PM Z01 253[6]
Power Supply Base—Balzers PCU 0200[6]
Make—Pfeiffer[6]
Asset #—145390[6]
Type—Turbomolecular vacuum pump system[6]
Bearing system—Hybrid bearing (ball and permanent magnetic bearing)[1]
Number of stages—Multiple stages[1]
Vacuum level—High and ultra-high vacuum[1]
Mounting position—Any mounting position[1]
Bearing type—Hybrid bearing system (ball and permanent magnetic bearing)[1]
Design—Multi-stage with rotor stacks[1]
Sources (6)Every fact above is drawn from these public sources
  1. [1]pfeiffervacuum.compfeiffervacuum.com
  2. [2]inventory listing
  3. [3]semistarcorp.comsemistarcorp.com
  4. [4]layla-ec.comlayla-ec.com
  5. [5]fabsurplus.comfabsurplus.com
  6. [6]inventory listing