Comparison ledger
Applied Materials 0010-03485 Magnet Assy, Nikon S 308 F, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03485 Magnet AssyApplied Materials | S 308 FNikon |
|---|---|---|
| OEM | Applied Materials | Nikon |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-03485 Magnet Assy | Nikon S 308 F |
| Specifications | ||
| Configuration | WP AL 300mm PVD[1] | HDD included[5] |
| OEM | Applied Materials[1] | — |
| Model | 0010-03485[1] | — |
| Description | MAGNET ASSY, WP AL 300MM PVD[2] | — |
| Process | PVD[3] | — |
| Wafer size | 300mm[4] | 200/300 mm[6] |
| Version | Spares[4] | — |
| Part Number | 0010-03485[1] | — |
| Manufacturer | Applied Materials[1] | — |
| Process Type | PVD (Physical Vapor Deposition)[1] | — |
| Application (Material) | Aluminum (AL)[1] | — |
| Wafer Diameter (associated) | 300 mm[1] | — |
| Light source | — | ArF (193 nm)[6] |
| Numerical aperture | — | 0.92[6] |
| Exposure area | — | 26 x 33 mm[6] |
| Reduction ratio | — | 1:4[6] |
| Resolution | — | <65 nm[6] |
| Throughput (300 mm) | — | >145 wph[6] |
| Throughput (200 mm) | — | >165 wph[6] |
| Overlay accuracy | — | 8 nm[6] |
| Polarization control | — | POLANO[6] |
| Wafer size (alternative) | — | 12 inch[5] |
| Wavelength | — | 193 nm[6] |
| Lens NA | — | 0.92[6] |
| Polarization Control | — | POLANO (optional)[6] |