Comparison ledger
Applied Materials 0010-03485 Magnet Assy, Nikon NSR SF 130, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03485 Magnet AssyApplied Materials | NSR SF 130Nikon |
|---|---|---|
| OEM | Applied Materials | Nikon |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-03485 Magnet Assy | Nikon NSR SF 130 |
| Specifications | ||
| Configuration | WP AL 300mm PVD[1] | — |
| OEM | Applied Materials[1] | — |
| Model | 0010-03485[1] | — |
| Description | MAGNET ASSY, WP AL 300MM PVD[2] | — |
| Process | PVD[3] | — |
| Wafer size | 300mm[4] | — |
| Version | Spares[4] | — |
| Part Number | 0010-03485[1] | — |
| Manufacturer | Applied Materials[1] | — |
| Process Type | PVD (Physical Vapor Deposition)[1] | — |
| Application (Material) | Aluminum (AL)[1] | — |
| Wafer Diameter (associated) | 300 mm[1] | — |
| Exposure Wavelength | — | i-line (365 nm)[5] |
| Numerical Aperture | — | ~0.50[5] |
| Max Wafer Size | — | 200 mm[5] |
| Throughput | — | ~100 wafers/hour[5] |
| Common Process Node | — | ≥ 0.25 μm[5] |
| Release Era | — | Early 2000s[5] |
| Optical System | — | High-quality projection lenses optimized for i-line lithography[5] |
| Stage and Alignment | — | Precision wafer stage with interferometer-based positioning, sub-micron alignment accuracy[5] |
| Automation | — | Motorized reticle loaders, wafer handling robots, SMIF pods[5] |
| Control Electronics | — | Proprietary Nikon control software and hardware[5] |