Comparison ledger
Applied Materials 0010-03254 E Chuck, Nikon NSR SF 200, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03254 E ChuckApplied Materials | NSR SF 200Nikon |
|---|---|---|
| OEM | Applied Materials | Nikon |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | — | Nikon NSR |
| Specifications | ||
| Configuration | — | HDD not included[1] |
| Chamber Type | — | Asahi[1] |
| Reticle Size | — | 6"[1] |
| Field Size | — | 26[1] |
| RL Linrary | — | L10+10[1] |
| Reticle PD/PPD | — | YEs[1] |
| Reticle SMIF | — | No[1] |
| Wafer Chuck Type | — | Pin[1] |
| Wafer Loader Type | — | Type 3[1] |
| Pre Alignment 2 | — | OF[1] |
| In-Line | — | Right[1] |
| Wafer Carrier Table | — | Right[1] |
| Alignment Sensor | — | LSA/FIA/LIA[1] |
| Mini Computer | — | Alpha[1] |
| Software Version | — | MCSV: Ver E5.21F Tool[1] |
| Laser | — | Gigaphoton G21K2[1] |
| Laser Total Shot | — | 19420.349 Mpls[1] |
| Wavelength | — | 248 nm[2] |
| Lens NA | — | 0.63[2] |
| Exposure Area | — | 26 mm x 33 mm[2] |
| Reduction Ratio | — | 1/4[2] |
| Resolution | — | < 150 nm[2] |
| Throughput (300 mm) | — | > 110 wafers/hour[2] |
| Throughput (200 mm) | — | > 120 wafers/hour[2] |
| Wafer Size (stated by source) | — | 200/300 mm[2] |
| Wafer Size (other source) | — | 6 inch[1] |