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Comparison ledger

0010-03254 E ChuckversusCORPORATION ALLIANCE 6

Applied Materials 0010-03254 E Chuck, LAM RESEARCH CORPORATION ALLIANCE 6, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-03254 E ChuckApplied Materials
OEMApplied MaterialsLAM RESEARCH
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
Family—LAM RESEARCH CORPORATION ALLIANCE 6
Specifications
Vintage—2007
Dry / Plasma Etch Vintage—2007
Number of chambers—4[1]
Chamber configuration—1 MW strip chamber, 2 PTX 9600 chambers, 1 PTX 9400 chamber, endpoint detection[1]
Sources (1)Every fact above is drawn from these public sources
  1. [1]semistarcorp.comsemistarcorp.com