Comparison ledger
AJA NT-80, Applied Materials 0010-13622 RF Match for, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | NT-80AJA | 0010-13622 RF Match forApplied Materials |
|---|---|---|
| OEM | AJA | Applied Materials |
| Category | Deposition | Deposition |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | AJA NT-80 | Applied Materials 0010-13622 RF Match for |
| Specifications | ||
| series | Nautilus Series Rotating Magnetron[1] | — |
| magnet array | configurable magnet array[1] | — |
| optimization capability | optimize target utilization, uniformity, or intentional non-uniformity[1] | — |
| co-deposition use | used with segmented, multi-material targets depositing onto spinning substrates for direct, variable co-depositions from a single magnetron[2] | — |
| Type | Nautilus Series Rotating Magnetron[1] | — |
| Configurable magnet array | Allows optimization of target utilization, uniformity, or intentional non-uniformity[1] | — |
| Application capability | Used with segmented, multi-material targets depositing onto spinning substrates for co-deposition tests[1] | — |
| Configuration | — | High Efficiency HE RF Match-Bias[3] |
| Model | — | 0010-13622[3] |
| Product Type | — | RF Match for PVD (Physical Vapor Deposition)[3] |
| Feature | — | High Efficiency HE RF Match-Bias[3] |
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