Waferpedia

Comparison ledger

ATC 2200versusCC2

AJA ATC 2200, Varian CC2, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
CC2Varian
OEMAJAVarian
CategoryDepositionDeposition
Wafer size6"6"
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyAJA ATC 2200Varian CC2
Cited variants—
Specifications
Tool typePVD tool; UHV sputtering system[2]—
Sputtering sources330-XP (UHV) magnetron sputtering sources in con-focal orientation[2]—
Source shuttersPneumatic source shutters[2]—
Gas injectionIntegral gas injection to source head for reactive sputtering and low pressure operation[2]—
Tilt adjustmentIn-situ tilt gimbals with locking UHV position indicator; allows source head angle adjustment without breaking vacuum[2]—
Viewports6" CF viewports[2]—
Substrate sizeTo 6"[2]—
HeatingRadiant heating to 800 C with quartz halogen lamps[2]—
Power sourcesDC and RF generators[2]—
Ion sourceKaufman KDC 40 4cm gridded ion source[2]—
Control systemPhase II-J Computer Control System[2]—
Process typePVD sputtering system[2]—
Magnetron sources330-XP (UHV) magnetron sputtering sources in confocal orientation[2]—
Reactive sputtering gas injectionIntegral gas injection to source head for reactive sputtering and low pressure operation[2]—
Source head adjustmentIn-situ tilt gimbals with locking UHV position indicator[2]—
Viewport size6" CF viewports[2]—
Power suppliesDC and RF generators[2]—
manual listed—Varian CC2 Manual[3]
film deposition type—sputter deposition of metals, alloys, and insulating thin films[3]
stage diameter—6" diameter stage[3]
co-sputter capability—co sputter capable[3]
reactive sputtering—available (Nitrogen or Oxygen)[3]
Model—CC2 (senTorr CC2)[3]
Part Number—L91213020000[1]
OEM—Varian[1]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]ebay.comebay.com
  2. [2]pnf.uchicago.edupnf.uchicago.edu
  3. [3]nanofab.utah.edunanofab.utah.edu