Comparison ledger
ABM -407B-2-S-CE-S293 Robot, Hitachi 8840, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 8840Hitachi | |
|---|---|---|
| OEM | ABM | Hitachi |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | ABM -407B-2-S-CE-S293 Robot | Hitachi 8840 |
| Specifications | ||
| Model | ABM-407B-2-S-CE-S293[1] | — |
| Description | ROBOT[1] | — |
| Refurbished RTP RTA | AG Associates 4100, 4108, 8108, 8800, 8800i,210, 310, 410, 610, 610I, MPT RTP-600S, 800S, RTP-3000[1] | — |
| KLA-Tencor Spare Parts and Service | RS-35C,RS-55,RS-75,RS-100,UV-1050,UV-1080,UV-1250,UV-1280,ASET F5 / F5X,AIT Systems,HRP-220 Stylus Profiler[1] | — |
| Refurbished Isotropic Plasma Etcher | Matrix, Tegal, Lam Research, Branson/IPC, PlasmaTherm[1] | — |
| Refurbished PECVD, ALD Equipment | Cambridge, Oxford PlasmaLab , Plasma-Therm, STS/SPTS, AMAT[1] | — |
| Refurbished Mask Aligner | Canon Neutronix PLA501/545, Suss MA200CC, MA8BA8 GEN3, MA8BA8 GEN2, MA8BA8, MA200E[1] | — |
| Refurbished Bonding | SUSS SB6E, SUSS SB8E, EVG 620 BA, EVG EV501, West Bond 7200AR 7400A[1] | — |
| Refurbished Wafer Prober | Electroglas EG 4090u+, EG 4090, EG 2001X, EG 1034X, Cascade PS-21[1] | — |
| Wafer size | — | 8-inch or 6-inch[2] |
| CD measurement range | — | 0.1 to 10 μm[2] |
| CD measurement reproducibility | — | ±1% or 0.005 μm (3 sigma), whichever larger[2] |
| Throughput | — | 26 wafers/hour (continuous measurement, 1 point/chip, 5 chips/wafer)[2] |
| Secondary electron image resolution | — | 5 nm (50 Å) at 0.8 kV[2] |
| Magnification | — | x1000 to x150,000 (SEM), about x110 (optical)[2] |
| Stage movement range | — | X and Y: 0 to 200 mm[2] |
| Stage drive | — | Pulse motor[2] |
| Stage max speed | — | 50 mm/s[2] |
| Electron gun | — | Schottky emission type[2] |
| Accelerating voltage | — | 500 to 1300 V (variable in 10 V steps)[2] |
| Lens system | — | Electromagnetic condenser lens system, FCM objective lens[2] |
| Secondary electron detection | — | 2-stage detection system[2] |
| Objective lens aperture | — | Heating type movable aperture, 4 openings selectable outside column[2] |
| Scanning coil | — | 2-stage deflection[2] |
| Stigmator coil | — | 8-pole electromagnetic type (X, Y)[2] |
| Probe current monitoring | — | Faraday cup incorporated with automatic measurement function[2] |
| Optical microscope field | — | 1.2 mm square, monochrome image[2] |
| Display | — | 20-inch monitor, EWS (GUI), interactive computer operation[2] |
| Scanning modes | — | TV scan, raster rotation, auto brightness/contrast control[2] |
| File storage | — | 3.5-inch floppy disk drive, 3.5-inch magneto-optic disk drive[2] |
| Data processing | — | Average value, standard deviation, maximum/minimum values[2] |
| Printer | — | 80-character thermal printer[2] |
| Vacuum system | — | Ion pump (3 units), turbo molecular pump (2 units), optional rotary pump (2 units)[2] |
| Main column dimensions | — | 1170 x 1890 x 1650 mm, 1100 kg[2] |
| Display unit dimensions | — | 600 x 1331 x 1800 mm, 320 kg[2] |
| Power supply dimensions | — | 535 x 600 x 1500 mm, 200 kg[2] |
| Rotary pump dimensions | — | 360 x 640 x 520 mm, 30 kg each (option)[2] |
| Power requirement | — | Single Phase, 100V[3] |
| Turbo controller | — | Included[3] |
| Lamp for alignment | — | 1 unit[3] |